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Magnesium Oxide Sputtering Target Purity: 99.9% Magnesium Oxide Sputtering Target is a ceramic material used in physical vapor deposition (PVD) processes to…
Silicon Carbide Sputtering Target
Silicon Carbide Sputtering Target Purity: 2N5-4N Shape: Rectangular, Disc, or Tube Silicon Carbide Sputtering Target is made from silicon carbide (SiC) with…
Boron Carbide Sputtering Target
Boron Carbide Sputtering Target Purity: 99.5% Shape: Rectangular, Disc, Tube Boron Carbide Sputtering Target (B₄C) is a high-performance material known for its…
Aluminum Nitride Sputtering Target
Aluminum Nitride Sputtering Target Purity: 99.5%-99.9% Aluminum Nitride Sputtering Target is made from high-purity aluminum oxide with uniform composition and dense…