Boron Carbide Sputtering Target

Boron Carbide Sputtering Target

Boron Carbide Sputtering Target Purity: 99.5% Shape: Rectangular, Disc, Tube Boron Carbide Sputtering Target (B₄C) is a high-performance material known for its…

Aluminum Nitride Granulation Powder

Aluminum Nitride Granulation Powder

Aluminum Nitride Granulation Powder Purity: 99%-99.9% Particle Size: 30-120 μm, or customized Aluminum Nitride Granulation Powder is a high-performance ceramic material,…

Aluminum Nitride Spherical Powder

Aluminum Nitride Spherical Powder

Aluminum Nitride Spherical Powder Purity: 99%-99.9% Particle Size: 30-120 μm, or customized Aluminum Nitride Spherical Powder is a high-performance ceramic material,…

Aluminum Nitride Powder

Aluminum Nitride Powder

Aluminum Nitride Powder Purity: 99%-99.9% Particle Size: 1.0-2.0 μm, or customized Aluminum Nitride Powder is a high-performance ceramic material with excellent…

Aluminum Nitride Custom Parts

Aluminum Nitride Custom Parts

Aluminum Nitride Custom Parts Purity: 95%-99% Aluminum Nitride Custom Parts are made from high-purity aluminum nitride ceramic, offering exceptional thermal conductivity,…

Aluminum Nitride Electrostatic Chuck

Aluminum Nitride Electrostatic Chuck

Aluminum Nitride Electrostatic Chuck Aluminum Nitride Electrostatic Chuck is made from high performance aluminum nitride ceramic, possessing exceptional thermal conductivity, strong…

Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target Purity: 99.5%-99.9% Aluminum Nitride Sputtering Target is made from high-purity aluminum oxide with uniform composition and dense…

Aluminum Nitride Substrate

Aluminum Nitride Substrate

Aluminum Nitride Substrate Purity: 95%-99% Aluminum Nitride Substrate is a high-performance ceramic material with exceptional thermal conductivity, electronic insulation, and high-temperature…